演讲嘉宾-徐科

徐科
中科院苏州纳米技术与纳米仿生研究所 教授

Prof. Ke Xu is the director of nano-characterization center, Suzhou Institute of Nano-tech and Nano-bionics, CAS. He received his B.S. and Master degree in material science at Xi’an Jiaotong University, and Ph.D. degree in Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences. His research area focused on III-nitride semiconductors, two dimensional material and related novel heterostructures. He systematically studied the growth behaviors of III-nitride semiconductors by MOCVD, MBE and HVPE. He found the important effects of crystal polarity on InN growth, and one of the main contributors find the narrow gap of InN. In recent years, he devoted to develop HVPE growth technology, succeeded in fabricating 2~4inch high quality GaN substrate for mass production. He found unusual contact properties of graphene with wide bandgap semiconductors, and investigated in acoustic properties of graphene on GaN. He has more than 80 peer-reviewed publications, and about 50 pending patents, delivered more than 20 invited talks in important conferences, such as ICNS-8, ICCG-16, E-MRS etc. He won China National Funds for Distinguished Young Scientists in 2013, and selected as “1000 talent program” member in 2012. He is also served as committee member of national “863” high-tech program.

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400-110-3655   

E-mail: meeting@c-gia.cn   meeting01@c-gia.cn

参展电话:13646399362(苏老师)

主讲申请:19991951101(王老师)

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凯发_徐科

凯发

演讲嘉宾-徐科

徐科
中科院苏州纳米技术与纳米仿生研究所 教授

Prof. Ke Xu is the director of nano-characterization center, Suzhou Institute of Nano-tech and Nano-bionics, CAS. He received his B.S. and Master degree in material science at Xi’an Jiaotong University, and Ph.D. degree in Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences. His research area focused on III-nitride semiconductors, two dimensional material and related novel heterostructures. He systematically studied the growth behaviors of III-nitride semiconductors by MOCVD, MBE and HVPE. He found the important effects of crystal polarity on InN growth, and one of the main contributors find the narrow gap of InN. In recent years, he devoted to develop HVPE growth technology, succeeded in fabricating 2~4inch high quality GaN substrate for mass production. He found unusual contact properties of graphene with wide bandgap semiconductors, and investigated in acoustic properties of graphene on GaN. He has more than 80 peer-reviewed publications, and about 50 pending patents, delivered more than 20 invited talks in important conferences, such as ICNS-8, ICCG-16, E-MRS etc. He won China National Funds for Distinguished Young Scientists in 2013, and selected as “1000 talent program” member in 2012. He is also served as committee member of national “863” high-tech program.

演讲题目:
主题会场
开始时间
结束时间
内容摘要

关于主办方

联系我们
400-110-3655   

E-mail: meeting@c-gia.cn   meeting01@c-gia.cn

参展电话:13646399362(苏老师)

主讲申请:19991951101(王老师)

官方微信订阅号
Copyright © 中国国际石墨烯创新大会 版权所有     运营机构:北京现代华清材料科技发展有限责任公司
grapchina.org 京ICP备10026874号-12   grapchina.cn 京ICP备10026874号-23
京公网安备 11010802023402号
分享到: